Organizer: CERAMIC APPLICATIONS
Moderator: Ulrich Werr, Göller Verlag
FALP (Fast Atomic Layer Processing) - In-situ Integrated ALE and PEALD Processes
S. Wege, A. Kumar Sony, E. Ricken and V. Singh Chaudhary, plasway-Technologies GmbH
3D Manufacturing of a Ceramic 2-channel Gas Distribution Ring (D 500mm) for Harsh Plasma Environments
S. Walter, M. Freihart and H. Wampers, Alumina Systems GmbH
Transparent Ceramic Materials - Challenges and Opportunities
Martin Drüe, Fraunhofer IKTS
Tailoring the Thermal Expansion Coefficient (CTE) of Silicon Nitride and Silicon Carbide Ceramics
Ulrich Degenhardt, qsil