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This work highlights the operating conditions and methods setup to achieve ppq level detection limits for more than 42 elements in various fine chemicals (H2SO4, H3PO4, NMP… among others used in the semiconductors and electronics. As the industry continue to evolve towards smaller process nodes, the importance of detecting metallic particulate at the nanometer levels is ever growing. The NexION multiquadrupole ICP-MS operating in single particle offer the industry the ability to scan, quantify, size, and count any particulate contaminant in the nanometer range.
I will also cover the integration of the NexION multiquadrupole ICP-MS with inline, online and other tools requiring metallic and particulate detection in the ppq range.
